Research Facilities[Synthesis and Treatment] [Film Characterization] [Computing Machines] [Retired Facilities] [KIST
Analysis Center] [NanoAnalysis
Center, KIST] |
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Synthesis and Treatment |
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Hybrid RF PACVD for a-C:H & nanocomposite coatings |
Ion Plating for me-DLC coating on complex shape substrate |
Dual Filtered Cathodic Arc for ta-C coatings & it's multilayers |
Rapid Thermal Process for annealing & thermal tretreatment |
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Thermal CVD for Carbon Nanotube Growth |
Pilot Scale HF PACVD for VCR Head Drum (Daewoo Electronics Co.) |
Pilot Scale RF PACVD for Spacer Tools of CRT Electron Gun Assembly (J&L Tech. Co. Ltd.) |
Pilot Scale Ion Plating System for Form Die / Nozzle of IC Packaging (J&L Tech. Co. Ltd.) |
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Charaterization Tools |
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Residual Stress Measurement System (2nd version, J&L Tech) |
In situ Stress Measurement System (kMOS) [Principle] |
Scratch Tester (J&L Tech) |
Wetting Angle Goniometer |
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Environmental Tribometer (home made) |
Optical Microscope (Olympus) |
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[KIST
Advanced
Analysis Center] [NanoAnalysis
Center, KIST]
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Computing Facilities |
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DLC
Network Scheme |
PC
cluster (Amber)
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PC
cluster (Topaz) |
PC
cluster (Intel 64) |
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Linux
Worstation (Ruby) |
Linux
Worstation (Diamond) CPU
: Xeon 3.0GHz |
Linux
Worstation CPU
: Opteron 248 (2.2GHz) |
NAS
Storage Buffalo
NAS / TrueImage |
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Retired Facilities |
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Real Time Stress Measurement System (home made: failed) |
Ball On Disk Wear-Rig (in Ambient Atmosphere) |
I-V Measurement System (home made) |
Thermal CVD for Carbon Nanotube Growth |
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Filtered Cathodic Arc for ta-C & ta-C:M Composite |
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