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Diam. Rel. Mater. 16, 1732-1738 (2007) [pdf] | ||
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Surface Energy of the Plasma Treated Si Incorporated Diamond-like Carbon Films |
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Ritwik
K. Roy, Heon-Woong Choi, Se-Jun Park, Kwang-Ryeol Lee |
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Surface energy and surface chemical bonds of the plasma treated Si incorporated diamond like carbon films (Si-DLC) were investigated. The Si-DLC films were prepared by r.f. plasma assisted chemical vapor deposition using benzene and diluted silane (SiH4/H2 = 10:90) as the precursor gases. The Si-DLC films were subjected to plasma treatment using various gases like N2, O2, H2 and CF4. The plasma treated Si-DLC films showed a wide range of water contact angles from 13.4° to 92.1°. The surface energies of the plasma treated Si-DLC films revealed a high polar component for O2 plasma treated Si-DLC films and a low polar component for CF4 plasma treated Si-DLC films. The CF4 plasma treated Si-DLC films indicated the minimum surface energy. X-ray photoelectron spectroscopy (XPS) showed that C=C, C-C and Si-C bonds are on the surface of all the samples. [C=N, C≡N, C-N, Si-N], [C=O, C-O, SiO2, Si2O3] and [C-CFn, CF-CFn, CF2, CF3] bonded networks were found on the surfaces of N2, O2 and CF4 plasma treated Si-DLC films, respectively. The polarizability of the bonds present on the surface explains the hydrophilicity and hydrophobicity of the plasma treated Si-DLC films. | ||
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